发明名称 DC HIGH-VOLTAGE SUPER-RADIANT FREE-ELECTRON BASED EUV SOURCE
摘要 An array of spatially separated beamlets is produced by a corresponding array of charged particle emitters. Each emitter is at an electrostatic potential difference with respect to an immediately adjacent emitter in the array. The beamlets are converged laterally to form an charged particle beam. The beam is modulated longitudinally with infrared radiation to form a modulated beam. The charged particles in the modulated beam are bunched longitudinally to form a bunched beam. The bunched beam may be modulated with an undulator to generate a coherent radiation output. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
申请公布号 US2014239805(A1) 申请公布日期 2014.08.28
申请号 US201313779331 申请日期 2013.02.27
申请人 PLETTNER TOMAS 发明人 PLETTNER TOMAS
分类号 G21K5/04 主分类号 G21K5/04
代理机构 代理人
主权项 1. A system, comprising: a) an electrostatic accelerator unit including an array of spatially separated charged particle emitters, each emitter having an electrostatic potential difference with respect to an immediately adjacent emitter in the array and each emitter producing an charged particle beamlet, whereby the array of charged emitters produces a corresponding array of charged particle beamlets having different energies, wherein the beamlets are converged laterally as one energy-modulated direct current (DC) charged particle beam at an output of the accelerator unit; and b) an optical-frequency modulator for longitudinally modulating the charged particle beamlets with infrared radiation, thereby forming modulated beamlets, wherein electrons in the modulated beamlets are bunched longitudinally to form a bunched energy-modulated DC electron beam.
地址 San Ramon CA US