发明名称 |
PLASMA CREATION DEVICE AND PLASMA PROCESSING DEVICE |
摘要 |
There is provided a plasma generation device, comprising: a waveguide configured to propagate a microwave; a plasma generation vessel connected to the waveguide; and a dielectric window interposed between the waveguide and the plasma generation vessel to introduce the microwave propagated by the waveguide into the plasma generation vessel. The plasma generation vessel is sphere-shaped and is disposed adjacent to a processing vessel configured to accommodate a substrate, and an interior of the plasma generation vessel is in communication with an interior of the processing vessel. |
申请公布号 |
KR20140104440(A) |
申请公布日期 |
2014.08.28 |
申请号 |
KR20147016559 |
申请日期 |
2012.12.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
TSUJI AKIHIRO;KANG, SONG YUN |
分类号 |
H05H1/46;C23C16/511;H01L21/205;H01L21/3065;H01L21/31 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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