发明名称 MICROWAVE ION SOURCE, AND ADJUSTMENT DEVICE OF MICROWAVE ION SOURCE
摘要 PROBLEM TO BE SOLVED: To provide a microwave ion source in which the volume of a vacuum chamber for plasma generation is adjustable, and to provide an adjustment device therefor.SOLUTION: A microwave ion source 10 comprises: a plasma chamber 11 including an inlet end 17 connected with a microwave waveguide 20, an outlet end 18 having an ion extraction aperture 21, and a sidewall 19 for connecting the inlet end 17 and outlet end 18, and having a fixed length in the axial direction from the inlet end 17 to the outlet end 18; a microwave introduction window 12 for partitioning a part on the ion extraction aperture 21 side of the plasma chamber 11 into a vacuum chamber 13 for plasma generation; and a positioning member for positioning the microwave introduction window 12 in a place separated from the inlet end 17 on the axial inside.
申请公布号 JP2014157791(A) 申请公布日期 2014.08.28
申请号 JP20130029404 申请日期 2013.02.18
申请人 SUMITOMO HEAVY IND LTD 发明人 MURATA HIROHIKO
分类号 H01J27/16;H01J37/08 主分类号 H01J27/16
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