发明名称 GUARD STRUCTURE FOR SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING GUARD LAYOUT PATTERN FOR SEMICONDUCTOR LAYOUT PATTERN
摘要 A guard structure for a semiconductor structure is provided. The guard structure includes a first guard ring, a second guard ring and a third guard ring. The first guard ring has a first conductivity type. The second guard ring has a second conductivity type, and surrounds the first guard ring. The third guard ring has the first conductivity type, and surrounds the second guard ring, wherein the first, the second and the third guard rings are grounded. A method of forming a guard layout pattern for a semiconductor layout pattern is also provided.
申请公布号 US2014239450(A1) 申请公布日期 2014.08.28
申请号 US201313781615 申请日期 2013.02.28
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 HORNG Jaw-Juinn;YEH Jen-Hao;YANG Fu-Chih;CHEN Chung-Hui
分类号 H01L21/76;H01L29/02 主分类号 H01L21/76
代理机构 代理人
主权项 1. A guard structure for a semiconductor structure, comprising: a first guard ring having a first conductivity type; a second guard ring having a second conductivity type, and surrounding the first guard ring; and a third guard ring having the first conductivity type, and surrounding the second guard ring, wherein the first, the second and the third guard rings are grounded.
地址 Hsinchu City TW