| 发明名称 |
MICRO-COLUMN WITH DOUBLE ALIGNER |
| 摘要 |
Disclosed herein is a microcolumn with a double aligner. The microcolumn is configured such that when an axis of an aperture of a limiting aperture is spaced apart from an original path of a particle beam, the path of the particle beam can be effectively compensated for in such a way that the path of the particle beam is aligned with the axis of the aperture of the limiting aperture by the double aligner. The microcolumn includes a source lens. The source lens includes at least two aligner layers which compensate for the path of the particle beam. |
| 申请公布号 |
US2014239190(A1) |
申请公布日期 |
2014.08.28 |
| 申请号 |
US201414184931 |
申请日期 |
2014.02.20 |
| 申请人 |
Industry-University Cooperation Foundation Sunmoon University |
发明人 |
OH Tae Sik;KIM Ho Seob;KIM Dae Wook;AHN Seung Joon |
| 分类号 |
H01J37/10 |
主分类号 |
H01J37/10 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A particle beam column comprising a source lens,
wherein the source lens comprises at least two aligner layers compensating for a path of a particle beam. |
| 地址 |
Chungcheongnam-do KR |
