发明名称 LOWER ELECTRODE AND MANUFACTURING METHOD THEREOF
摘要 <p>The present invention relates to the field of dry etching. Provided are a lower electrode and a manufacturing method thereof, which can solve the problem in the prior art that ceramic points easily fall off from ceramic layers due to a low bonding strength caused by the fact that the ceramic points and the ceramic layers of the lower electrode are formed through different procedures. The lower electrode (1) comprises a metal substrate (2) and an insulating layer (5), the metal substrate (2) comprising a substrate body (21) and projecting portions (22) on an upper surface of the substrate body (21); the insulating layer covers the upper surface of the substrate body and the projecting portions on the upper surface of the substrate body, thus forming projecting insulating points (51) at the projecting portions. The present invention is suitable for design and fabrication of parts of an etching device.</p>
申请公布号 WO2014127581(A1) 申请公布日期 2014.08.28
申请号 WO2013CN74644 申请日期 2013.04.24
申请人 BOE TECHNOLOGY GROUP CO., LTD.;BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. 发明人 JIANG, XIAOWEI;XIAO, HONGXI;LIU, HUAFENG;CHEN, HAO;ZHU, XIAOHUI
分类号 H01L23/00;G02F1/1343;H01J37/32 主分类号 H01L23/00
代理机构 代理人
主权项
地址