| 摘要 |
The present invention provides a conductive material precursor and a conductive material production method capable of producing the conductive material with high productivity, whereby a conductive pattern having sufficient total light transmittance and having good conductivity can be formed and a conductive pattern having excellent adhesiveness can be formed, even if the conductive pattern is minute. The present invention pertains to a conductive material production method which includes: a step in which the conductive material precursor having a support body, an undercoat layer containing a water-soluble polymer compound, a cross-linking agent, and a metal sulfide, and a photosensitive resist layer, laminated in said order, and the photosensitive resist layer surface of the conductive material precursor having the support body, the undercoat layer containing the water-soluble polymer compound, the cross-linking agent, and the metal sulfide, and the photosensitive resist layer, laminated in said order, are exposed in any pattern shape and developed, and a resist image of the exposed pattern is formed; a step in which electroless plating is performed on the surface on which the resist image is formed, and a conductive pattern is formed upon the undercoat layer not covered by the resist image; and a step in which the resist image is then removed. |
