| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a novel plasma processing apparatus and plasma processing method, capable of making a surface of a stereoscopic structure in a complicated geometry expose to plasma with high efficiency and uniformly.SOLUTION: The plasma processing apparatus includes: a processing container 12 including a plasma generating section; a control section 14; and a drive section 16. The processing section 12 includes a plasma generation section 11 for generating plasma therein. The control section 14 includes a power circuit for supplying electric power required to generate plasma in the processing container 12. The drive section 16 includes a power transmission section that generates power and transmits power from the outside of the processing container 12 to the processing container 12.</p> |
