发明名称 |
Process for producing unitary graphene materials |
摘要 |
A process for producing a unitary graphene material, comprising: (a) preparing a graphene oxide (GO) gel having GO molecules dissolved in a fluid medium wherein the GO molecules contain higher than 20% by weight of oxygen; (b) dispensing and depositing a layer of GO gel onto a surface of a substrate to form a layer of deposited GO gel thereon, wherein the dispensing and depositing procedure includes shear-induced thinning; (c) removing the fluid medium from the deposited GO gel to form a GO layer having an inter-plane spacing d002 of 0.4 nm to 1.2 nm as determined by X-ray diffraction; and (d) heat treating the GO layer to form the unitary graphene material at a heat treatment temperature higher than 100° C. to an extent that d002 is decreased to a value of 0.3354 nm to 0.4 nm and the oxygen content is decreased to less than 5% by weight. |
申请公布号 |
US2014242275(A1) |
申请公布日期 |
2014.08.28 |
申请号 |
US201313815349 |
申请日期 |
2013.02.25 |
申请人 |
Zhamu Aruna;Wang Mingchao;Fu Lucy;Jang Bor Z. |
发明人 |
Zhamu Aruna;Wang Mingchao;Fu Lucy;Jang Bor Z. |
分类号 |
C01B31/04 |
主分类号 |
C01B31/04 |
代理机构 |
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代理人 |
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主权项 |
1. A process for producing a unitary graphene material, said process comprising: (a) preparing a graphene oxide gel having graphene oxide molecules dissolved in a fluid medium wherein said graphene oxide molecules contain an oxygen content higher than 20% by weight; (b) dispensing and depositing a layer of said graphene oxide gel onto a surface of a supporting substrate to form a deposited graphene oxide gel thereon, wherein said dispensing and depositing procedure includes shear-induced thinning of said graphene oxide gel; (c) partially or completely removing said fluid medium from the deposited graphene oxide gel to form a graphene oxide mass having an inter-plane spacing d002 of 0.4 nm to 1.2 nm as determined by X-ray diffraction and an oxygen content no less than 20% by weight; and (d) heat treating the graphene oxide mass to form said unitary graphene material at a heat treatment temperature higher than 100° C. to an extent that an inter-plane spacing d002 is decreased to a value of from 0.3354 nm to 0.4 nm and the oxygen content is decreased to less than 5% by weight. |
地址 |
Centerville OH US |