| 摘要 |
The present invention relates to a device and a method for measuring the thickness of a film of an in-line deposition device. The device for measuring the thickness of the film of the in-line deposition device includes an in-line deposition chamber where a deposition process is performed while substrates are transferred in order to measure the thickness of the films deposited on each region without being against of a processing flow; a plurality of evaporating sources which is installed on the lower part of the in-line deposition chamber to be communicated and supplies raw materials; a transferring member which transfers the substrates in one direction inside the in-line deposition chamber; a monitoring transferring body which is supported by the transferring member, is transferred with the substrates, and makes the raw materials supplied from the evaporating sources be penetrated and deposited on each region of the substrates; and a measuring member which measures the thickness of the raw materials deposited on the substrates transferred with the monitoring transferring body. Therefore, the present invention has effects of measuring the thickness of the films deposited on each region as the regions where each source is deposited inside the in-line deposition device in which the sources are applied are different; and checking the amount of the deposition without being against of the processing flow. |
