发明名称 |
Fe-Pt-BASED SPUTTERING TARGET IN WHICH C PARTICLES ARE DISPERSED |
摘要 |
Provided is a sputtering target for a magnetic recording film, the sputtering target comprising 5 mol % or more and 60 mol % or less of Pt, 0.1 mol % or more and 40 mol % or less of C, 0.05 mol % or more and 20 mol % or less of titanium oxide, and the remainder being Fe. It is an object of the present invention to provide a high-density sputtering target that can produce a granular magnetic thin film without using any high-cost co-sputtering apparatuses and can also reduce the amount of particles generated during sputtering. |
申请公布号 |
SG2014013940(A) |
申请公布日期 |
2014.08.28 |
申请号 |
SG20140013940 |
申请日期 |
2012.12.18 |
申请人 |
JX NIPPON MINING & METALS CORPORATION |
发明人 |
OGINO SHIN-ICHI;SATO ATSUSHI;NAKAMURA YUICHIRO |
分类号 |
C23C14/34;B22F3/10;B22F3/14;C22C5/04;C22C32/00;C22C33/02;C22C38/00 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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