FOCUS POSITION ADJUSTING APPARATUS, RETICLE, FOCUS POSITION ADJUSTING PROGRAM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

According to one embodiment, a step difference estimation unit, an assist pattern generation unit, and a spherical aberration conversion unit are installed. The step difference estimation unit estimates step difference of a processing layer. The assist pattern generation unit adds an assist pattern having different sensitivity to spherical aberration in an exposure process to a mask pattern based on the step difference of the processing layer. The spherical aberration conversion unit converts the step difference of the processing layer into the spherical aberration.

主权项

1. A focus position adjusting apparatus comprising:
a step difference estimation unit which estimates a step difference of a processing layer; an assist pattern generation unit which adds a first assist pattern and a second assist pattern to a mask pattern based on the step difference of the processing layer, the first assist pattern and the second assist pattern having different sensitivity with respect to each other to spherical aberration in an exposure process; and a spherical aberration conversion unit which converts the step difference of the processing layer into the spherical aberration.