发明名称 |
ELECTROLESS PLATED MATERIAL FORMED DIRECTLY ON METAL |
摘要 |
A method for forming magnetic conductors includes forming a metal structure on a substrate. Plating surfaces are prepared on the metal structure for electroless plating by at least one of: masking surfaces of the metal structure to prevent electroless plating on masked surfaces and/or activating a surface of the metal structure. Magnetic material is electrolessly plated directly on the plating surfaces to form a metal and magnetic material structure. |
申请公布号 |
US2014239443(A1) |
申请公布日期 |
2014.08.28 |
申请号 |
US201313968822 |
申请日期 |
2013.08.16 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
Gallagher William J.;O'Sullivan Eugene J.;Wang Naigang |
分类号 |
H01L49/02 |
主分类号 |
H01L49/02 |
代理机构 |
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代理人 |
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主权项 |
1. An on-chip magnetic device, comprising:
a metal shape including one or more plating surfaces, the plating surfaces being configured to permit electroless material growth directly thereon; and a magnetic structure including an electrolessly plated magnetic material formed directly on the metal shape on the plating surfaces to form a metal and magnetic material inductive structure. |
地址 |
Armonk NY US |