发明名称 SUBSTRATE PROCESSING APPARATUS, SIMULATION DEVICE, PROGRAM, AND SIMULATION METHOD
摘要 <p>PROBLEM TO BE SOLVED: To perform a simulation in which the state of a gas flowchart for a recipe or the state of a process being performed is realized in detail.SOLUTION: The simulation device of a substrate processing apparatus includes: an information acquisition unit for acquiring gas flow information defined by an operation mode of processing the substrate; a route determination unit for determining the route of the gas on the basis of the gas flow information acquired by the information acquisition unit; and a simulation unit for simulating the gas flow by coloring the gas route determined by the route determination unit in a color defined in response to the type of the gas.</p>
申请公布号 JP2014157458(A) 申请公布日期 2014.08.28
申请号 JP20130027563 申请日期 2013.02.15
申请人 TOKYO ELECTRON LTD 发明人 YAMAMOTO TOMOKO;MIURA KIMITOSHI
分类号 G06F17/50;G05B23/02;H01L21/02 主分类号 G06F17/50
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