| 摘要 |
PROBLEM TO BE SOLVED: To provide a film of a silica composition having few cavities and defects, and good adhesion with a substrate, and to provide a simple process for synthesis of a film containing silica. ! SOLUTION: Provided is a process for synthesis of a film containing silica, comprising contacting a first phase and a second phase on a substrate to form a film containing silica, wherein the first phase is a water-insoluble organic solvent in which a silica precursor is soluble, and the second phase contains at least water. More preferably, provided is a process for synthesis of a film of a silica composition containing silica and an adhesive polymer. Also provided is a film of a silica composition containing silica and a polydopamine. ! COPYRIGHT: (C)2014,JPO&INPIT |
