| 发明名称 |
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN, AND TOP COAT MATERIAL |
| 摘要 |
A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing. |
| 申请公布号 |
US2014238954(A1) |
申请公布日期 |
2014.08.28 |
| 申请号 |
US201414185052 |
申请日期 |
2014.02.20 |
| 申请人 |
Tokyo Institute of Technology ;Tokyo Ohka Kogyo Co., Ltd. |
发明人 |
Matsumiya Tasuku;Seshimo Takehiro;Ohmori Katsumi;Miyagi Ken;Shiono Daiju;Miyashita Kenichiro;Kurosawa Tsuyoshi;Hayakawa Teruaki |
| 分类号 |
C09D5/26 |
主分类号 |
C09D5/26 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of producing a structure containing a phase-separated structure, the method comprising:
forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit, forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer, and subjecting the layer containing the block copolymer with the top coat film formed thereon to phase separation by thermal annealing. |
| 地址 |
Tokyo JP |
