发明名称 SUBSTRATE STORAGE CONTAINER AND EXPOSURE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a reticle storage container having a new structure, which can transport a reticle in a hermetic state and can be used as a reticle library while installed on an exposure apparatus, and to provide the exposure apparatus having the reticle storage container mounted thereon.SOLUTION: A reticle storage container includes an inner container (10) which can store a plurality of reticles (16) and an outer container (1) which covers the inner container (10). The outer container (1) has a gas nozzle (5) which allows a predetermined gas to be injected into it. The same gas as the gas supplied into an exposure apparatus (20) is supplied to the gas nozzle (5). The gas injected into the reticle storage container is vented through a vent hole (14) installed to the inner container (10).
申请公布号 JP2014157190(A) 申请公布日期 2014.08.28
申请号 JP20130026910 申请日期 2013.02.14
申请人 TOSHIBA CORP 发明人 SHIBANO KOHEI;TANAKA OSAMU;TORIUMI KEIGO
分类号 G03F1/66;G03F7/20;H01L21/027;H01L21/673 主分类号 G03F1/66
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