| 发明名称 |
PRODUCTION METHOD AND EVALUATION APPARATUS FOR MASK LAYOUT |
| 摘要 |
According to one embodiment, a production method for a mask layout of an exposure mask includes evaluating a candidate layout by comparison between an imaged image group and a reference image group. The imaged image group is composed of a plurality of imaged images of patterns formed by performing lithography under a plurality of levels of exposure condition using the candidate layout. The reference image group is composed of a plurality of reference images produced by simulation on assumption of a plurality of levels of the exposure condition. |
| 申请公布号 |
US2014242498(A1) |
申请公布日期 |
2014.08.28 |
| 申请号 |
US201314013213 |
申请日期 |
2013.08.29 |
| 申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Kono Yuko;Masukawa Kazuyuki;Kotani Toshiya;Kodama Chikaaki;Kai Yasunobu |
| 分类号 |
G06F17/50;G03F1/68 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A production method for a mask layout of an exposure mask, comprising:
evaluating a candidate layout by comparison between an imaged image group and a reference image group, the imaged image group being composed of a plurality of imaged images of patterns formed by performing lithography under a plurality of levels of exposure condition using the candidate layout, and the reference image group being composed of a plurality of reference images produced by simulation on assumption of a plurality of levels of the exposure condition. |
| 地址 |
Minato-ku JP |
