PATTERN-MEASURING APPARATUS AND SEMICONDUCTOR-MEASURING SYSTEM

摘要

It is an object of the present invention to provide a semiconductor-measuring system and a pattern-measuring apparatus capable of obtaining an evaluation result for appropriately selecting a treatment intended for a semiconductor device. To achieve this object, there is proposed in the present invention a pattern-measuring apparatus provided with an arithmetic unit for comparing the circuit pattern of the electronic device and a reference pattern. The arithmetic unit classifies the circuit pattern in circuit-pattern treatment units on the basis of a comparison between the measurement result between the circuit pattern and the reference pattern, and at least two thresholds.