| 摘要 |
<p>Method for performing an integrated circuit flow step, said method comprising providing a substrate (1) having a topography presenting a relief (2), providing an anti-reflective film (3) conformally on said substrate wherein said provision involves a Molecular Layer Deposition step, wherein said anti-reflective film (3) comprises at least an organic compound, eventually chemically bound to an inorganic compound, wherein the organic compound or the inorganic compound is bound to the substrate and wherein said organic compound absorbs light at at least one wavelength selected in the range 150-500 nm, and, providing a photoresist layer (4) over said anti-reflective film (3).</p> |
