发明名称
摘要 PROBLEM TO BE SOLVED: To simplify processes and decrease the number of processes when forming a multilayer integrated circuit having a multilayer structure of single crystal semiconductor layers on a support substrate; and improve yield. SOLUTION: In a semiconductor device, semiconductor junction interface regions of semiconductor elements in a substrate surface are arranged such that laser beams can be directly irradiated to heat the substrate from a support substrate side, in other words, from a surface of the substrate on which an element is not formed. After a first semiconductor element layer and a second semiconductor element layer are formed, activations of semiconductor junction interface regions of the first semiconductor element layer and the second semiconductor element layer are simultaneously performed by irradiation of laser beams from the support substrate side. A layer between the support substrate and the semiconductor element layer is light permeable and has a structure not to attenuate laser beams. COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5581411(B2) 申请公布日期 2014.08.27
申请号 JP20130024382 申请日期 2013.02.12
申请人 发明人
分类号 H01L21/336;H01L21/02;H01L21/20;H01L21/265;H01L21/8234;H01L27/088;H01L27/12;H01L29/786 主分类号 H01L21/336
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