| 摘要 |
A cleaning apparatus (1) includes a cleaning tank (2), a coupling tank (3), an ultrasonic wave generation unit (6), and a modification unit (7). The cleaning tank (2) holds a cleaning liquid (4) for cleaning a substrate (10) serving as an object to be cleaned. The coupling tank (3) holds an intermediate medium (5), and the cleaning tank (2) has a portion in contact with the intermediate medium (5). The ultrasonic wave generation unit (6) is provided at the coupling tank (3), and ultrasonically vibrates the cleaning liquid (4) via the intermediate medium (5). The modification unit (7) modifies a difference in sonic velocity between the cleaning liquid (4) and the intermediate medium (5). |
