发明名称 MAGNETORESISTIVE STRUCTURE, MEMORY DEVICE INCLUDING THE SAME AND MANUFACTURING METHODS THEREOF
摘要 <p>Disclosed are a magnetoresistive structure, a memory device including the magnetoresistive structure, and a manufacturing method thereof. The disclosed magnetoresistive structure includes a free magnetization layer; a separation layer wider than the free magnetization layer; and a fixed magnetization layer wider than the free magnetization layer. Multiple pieces of the free magnetization layer can be provided. The separation layer and the fixed magnetization layer can have a structure covering the multiple free magnetization layers. The separation layer can be arranged on the free magnetization layers, or the free magnetization layers can be arranged on the separation layer.</p>
申请公布号 KR20140103771(A) 申请公布日期 2014.08.27
申请号 KR20130017662 申请日期 2013.02.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, SUNG CHUL;KIM, KWANG SEOK;KIM, KEE WON;JANG, YOUNG MAN;PI, UNG HWAN
分类号 G11C11/15;H01L21/8247;H01L27/115 主分类号 G11C11/15
代理机构 代理人
主权项
地址