Method for manufacturing a barrier layer on a substrate and a multi-layer stack

摘要

A method for manufacturing a barrier layer (14) on a flexible substrate (6a, 6b), comprising depositing an inorganic layer on the substrate in a treatment space (5), the treatment space (5) being formed between at least two electrodes (2, 3) for generating an atmospheric pressure glow discharge plasma. The barrier layer (14) is characterized in that it is formed by three subsequent depositions of inorganic layers on the substrate (6a, 6b), each layer being at most 150 nm in thickness.

主权项

1. A method for manufacturing a water vapour barrier layer on a flexible substrate, comprising depositing an inorganic layer on the substrate in a treatment space having a gas atmosphere, the treatment space being formed between at least two electrodes for generating an atmospheric pressure glow discharge plasma, characterized in that (i) the barrier layer is formed by at least three subsequent inorganic layer depositions on the substrate, each inorganic layer deposition being at most 150 nm in thickness, (ii) the treatment space comprises between 4 and 25% of oxygen, and (iii) the barrier layer is formed with a duty cycle of 100%.