MULTI-ZONE RESISTIVE HEATING APPARATUS, REACTOR INCORPORATING THE MULTI-ZONE RESISTIVE HEATING APPARATUS, HEATING SYSTEM FOR A CHEMICAL VAPOR DEPOSITION APPARATUS, AND METHOD FOR RESISTIVE HEATING OF SUBSTRATE

摘要

Disclosed are an apparatus to heat a substrate, a reactor, and a method. The apparatus includes: a stage including a surface and a body having a zone to support a substrate and a body; a shaft coupled to the stage; a first heating element arranged on the central zone of the body of the stage; and at least a second heating element and a third heating element arranged inside the body of the stage. The second and third heating elements partially and respectively surround the first heating element, and the second and third heating elements are mutually in contact with each other in the circumferential direction.