发明名称 Method of producing film by inkjet process, and film
摘要 To provide a method of producing a film, comprising: ejecting a liquid B over a liquid surface of an active energy ray-curable liquid as a liquid A by an inkjet process, according to a predetermined periodic signal; and subsequently applying an active energy ray to the liquid A and the liquid B so as to perform curing and obtain a film which comprises a pattern according to any one of (1) to (4) below, (1) a smooth pattern having a periodic amplitude based upon a trigonometric function, (2) a pattern having a periodic depression, (3) a pattern in the form of a periodic flat surface, and (4) a pattern having a periodic semicylindrical shape.
申请公布号 US8815140(B2) 申请公布日期 2014.08.26
申请号 US201113640198 申请日期 2011.04.08
申请人 Ricoh Company, Ltd. 发明人 Aruga Tamotsu;Seno Shinya;Koyano Masayuki;Noda Eiji;Takeuchi Noriyasu;Maekawa Tsutomu;Hiraoka Takao;Hasegawa Tomoko;Kimura Okitoshi;Noguchi Soh
分类号 B41J2/21 主分类号 B41J2/21
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A method of producing a film, the method comprising: (I) ejecting a liquid B over a liquid surface comprising an active energy ray-curable liquid A by an inkjet process, according to a predetermined periodic signal; and subsequently (II) applying an active energy ray to the liquid A and the liquid B, thereby curing and obtaining a film comprising a pattern according to any one of (1) to (4): (1) a smooth pattern comprising a periodic amplitude based upon a trigonometric function;(2) a pattern comprising a periodic depression;(3) a pattern in the form of a periodic flat surface; and(4) a pattern comprising a periodic semicylindrical shape, wherein the liquid A is greater than the liquid B in static surface tension at 25° C., and the liquid A has a static surface tension of 35 mN/m or greater at 25° C.
地址 Tokyo JP