发明名称 |
Method of producing film by inkjet process, and film |
摘要 |
To provide a method of producing a film, comprising: ejecting a liquid B over a liquid surface of an active energy ray-curable liquid as a liquid A by an inkjet process, according to a predetermined periodic signal; and subsequently applying an active energy ray to the liquid A and the liquid B so as to perform curing and obtain a film which comprises a pattern according to any one of (1) to (4) below, (1) a smooth pattern having a periodic amplitude based upon a trigonometric function, (2) a pattern having a periodic depression, (3) a pattern in the form of a periodic flat surface, and (4) a pattern having a periodic semicylindrical shape. |
申请公布号 |
US8815140(B2) |
申请公布日期 |
2014.08.26 |
申请号 |
US201113640198 |
申请日期 |
2011.04.08 |
申请人 |
Ricoh Company, Ltd. |
发明人 |
Aruga Tamotsu;Seno Shinya;Koyano Masayuki;Noda Eiji;Takeuchi Noriyasu;Maekawa Tsutomu;Hiraoka Takao;Hasegawa Tomoko;Kimura Okitoshi;Noguchi Soh |
分类号 |
B41J2/21 |
主分类号 |
B41J2/21 |
代理机构 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A method of producing a film, the method comprising:
(I) ejecting a liquid B over a liquid surface comprising an active energy ray-curable liquid A by an inkjet process, according to a predetermined periodic signal; and subsequently (II) applying an active energy ray to the liquid A and the liquid B, thereby curing and obtaining a film comprising a pattern according to any one of (1) to (4):
(1) a smooth pattern comprising a periodic amplitude based upon a trigonometric function;(2) a pattern comprising a periodic depression;(3) a pattern in the form of a periodic flat surface; and(4) a pattern comprising a periodic semicylindrical shape, wherein the liquid A is greater than the liquid B in static surface tension at 25° C., and the liquid A has a static surface tension of 35 mN/m or greater at 25° C. |
地址 |
Tokyo JP |