Emissivity profile control for thermal uniformity

摘要

A substrate for processing in a heating system is disclosed. The substrate includes a bottom portion for absorbing heat from a radiating heat source, the bottom portion having a first region having a first emissivity and a second region having a second emissivity less than the first emissivity. The first region and the second region promote thermal uniformity of the substrate by compensating for thermal non-uniformity of the radiating heat source.

主权项

1. A method for heating a substrate, the method comprising:
disposing a substrate above a radiant heat source, wherein a bottom surface of the substrate faces a top surface of the radiant heat source; heating the radiant heat source, wherein the top surface of the radiant heat source has a non-uniform temperature distribution when heated, wherein a temperature of the top surface of the radiant heat source varies as a function of a radius of the radiant heat source by more than 300K; and transferring heat from the radiant heat source to the substrate in a uniform manner across the bottom surface of the substrate, wherein the uniform heat transfer is achieved by having a variable emissivity profile across the bottom surface of the substrate, the variable emissivity profile corresponding to a variable emissivity of the bottom surface of the substrate, a variable emissivity of the top surface of the radiant heat source, or a combination of the variable emissivity of the bottom surface of the substrate and the variable emissivity of the top surface of the radiant heat source.