SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

The present invention provides a substrate processing apparatus capable of preventing an exhaust head and a nozzle arm to support the exhaust head from being polluted, and a substrate processing method. As a solution means, the nozzle arm (62) to support the exhaust head is moved between an upper processing position of a substrate (W) and a standby position outside a processing cup surrounding the substrate (W) by a rotation driver (63). When the nozzle arm (62) in which the substrate (W) is cleaned is positioned at the standby position, a cleaning solution spurts towards an oblique lower nozzle arm (62) from a shower nozzle (71). A flow of the cleaning solution obliquely spurting downward ascends through three nozzle arms (62) so that the three nozzle arms (62) are sequentially cleaned. Nitrogen gas from a dry gas nozzle (76) is injected to the nozzle arm (62) to dry the cleaning solution attached to the arm.