发明名称 |
COMPLEX OXIDE SINTERED BODY, SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE FILM, AND METHOD FOR PRODUCING SAME |
摘要 |
The present invention provides a complex oxide sintered body 10 wherein Zr/(In + Zr + Y) is 0.05 to 4.5 at% and Y/(In + Zr + Y) is 0.005 to 0.5 at% in an atomic ratio when indium, zirconium, and yttrium are designated by In, Zr, and Y, respectively. Moreover, the present invention provides a sputtering target including the complex oxide sintered body 10 and a transparent conductive oxide film obtained by sputtering the sputtering target. |
申请公布号 |
KR20140103097(A) |
申请公布日期 |
2014.08.25 |
申请号 |
KR20147011254 |
申请日期 |
2012.11.29 |
申请人 |
TOSOH CORPORATION |
发明人 |
KURAMOCHI HIDETO;TAMANO KIMIAKI;IIGUSA HITOSHI;AKIIKE RYO;SHIBUTAMI TETSUO |
分类号 |
C04B35/106;C04B35/50;C04B35/505;C23C14/34 |
主分类号 |
C04B35/106 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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