发明名称 FLOW RATE CONTROL DEVICE OF LIQUID USED FOR POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a flow rate control device in which a flow rate regulating valve of a dressing liquid and/or nozzle cleaning liquid can be easily operated while protecting a device arranged in the flow rate control device from a liquid such as a polishing liquid and the dressing liquid.SOLUTION: Polishing liquid transfer pipes 130, 131, 132, flow rate sensors 134, 135, 136 for measuring a flow rate of a polishing liquid flowing in the polishing liquid transfer pipes 130, 131, 132, a dressing liquid transfer pipe 110 in which a dressing liquid flows, and a dressing liquid flow rate regulating valve 112 which regulates a flow rate of the dressing liquid flowing in the dressing liquid transfer pipe 110 are arranged in a housing container 104. An opening part 104b is formed on the housing container 104 in a position corresponding to the dressing liquid flow rate regulating valve 112, and the housing container 104 includes a lid member 106 for covering the opening part 104b.
申请公布号 JP2014151381(A) 申请公布日期 2014.08.25
申请号 JP20130021457 申请日期 2013.02.06
申请人 EBARA CORP 发明人 ERIGUCHI MASAAKI;USHIMARU SEIYA
分类号 B24B37/00 主分类号 B24B37/00
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