| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an imprint mold furnished, on one side of a substrate possessing in-plane segments having mutually different thicknesses, with a fine uneven pattern of a high precision based on a dry etching scheme using a plasma and a method for forming, in a high precision on one side of a substrate possessing segments having mutually different thicknesses, a fine uneven pattern based on a dry etching scheme using a plasma.SOLUTION: The provided method for manufacturing an imprint mold 1 by using a substrate 10 including a first dielectric and possessing a first side 10a and a second side 10b opposing the first side 10a in a state where a recessed portion 13 is formed on the second side 10b comprises: a permittivity adjustment member arrangement step of arranging, within the recessed portion 13, a permittivity adjustment member 30 including a second dielectric; and a pattern formation step of forming, on the first side 10a of the substrate 10 where the permittivity adjustment member 30 is arranged within the recessed portion 13, a fine uneven pattern 2 based on a dry etching scheme using a plasma. |
