发明名称 FIELD EFFECT TRANSISTOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a field effect transistor which has a high breakdown voltage and a low on-resistance.SOLUTION: The field effect transistor includes: a first semiconductor part made of silicon, germanium, or silicon germanium; a second semiconductor part made of a nitride-based semiconductor; a diffusion preventing layer which is formed between the first semiconductor part and the second semiconductor part and prevents atomic diffusion between the first semiconductor part and the second semiconductor part; a gate insulating film formed on a surface of the first semiconductor part; and a gate electrode formed on the gate insulating film.</p>
申请公布号 JP2014154729(A) 申请公布日期 2014.08.25
申请号 JP20130023731 申请日期 2013.02.08
申请人 FURUKAWA ELECTRIC CO LTD:THE;FUJI ELECTRIC CO LTD 发明人 KANBAYASHI HIROSHI ; TERAMOTO AKINOBU ; OMI TADAHIRO
分类号 H01L29/812;H01L21/336;H01L21/337;H01L21/338;H01L29/12;H01L29/778;H01L29/78;H01L29/808 主分类号 H01L29/812
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