| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming an alignment mark in which a highly accurate alignment mark can be formed by suppressing formation of wastes.SOLUTION: (a) Ink is discharged to a region where an alignment mark is to be placed out of the surface of a substrate, and a thin film for an alignment mark composed of ink is formed. (b) The region of a part of the inside of the thin film for an alignment mark is irradiated with light, and the thin film for an alignment mark in the region irradiated with the light is cured or removed, thereby forming the alignment mark in the region irradiated with the light. |
