| 摘要 |
PROBLEM TO BE SOLVED: To output EUV light satisfying a request from an exposure device.SOLUTION: A chamber used in an extreme-ultraviolet light generator for generating extreme-ultraviolet light by irradiating a target material with laser light comprises: a chamber container; a heat shield disposed in the chamber container between a predetermined region where the target material is plasmatized and the chamber container, and absorbing heat generated in the predetermined region by plasmatizing the target material; and a support for attaching the heat shield to the chamber container. The support may include an absorption part which absorbs the stress of heat deformation of the heat shield, by telescoping as the heat shield deforms by heat. |
