| 摘要 |
PROBLEM TO BE SOLVED: To provide a fluorine-based surfactant which suitably gives a positive resist composition excellent in levelling property and developability and which is easily produced, and to provide a positive resist composition using the surfactant.SOLUTION: The fluorine-based surfactant has a fluorinated alkyl group and a tertiary butyl group. The positive resist composition comprises the above fluorine-based surfactant, a resin which shows increase in the solubility with an alkaline solution by an action of an acid, and an acid generating component which generates an acid by exposure. |
