发明名称 MEASURING APPARATUS AND EXPOSURE DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To load a wafer onto a stage flatly.SOLUTION: Shape of a wafer W is measured by entering the measurement light to the back side of the wafer W held by means of a loading disk 121, and receiving the reflection light while scanning the back side of the wafer W, by using a line sensor 142 provided on a measurement stage MST. Consequently, the shape of the wafer W held by means of the loading disk 121 can be measured accurately. The wafer W can be loaded onto a wafer stage WST flatly, by using a loading unit 120 (loading disk 121).</p>
申请公布号 JP2014154647(A) 申请公布日期 2014.08.25
申请号 JP20130021875 申请日期 2013.02.07
申请人 NIKON CORP 发明人 OCHIAI ARATA ; EDA TAKESHI ; IBE TAISUKE
分类号 H01L21/027;B65G49/07;G01B11/24;G03F7/20;H01L21/677 主分类号 H01L21/027
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