| 摘要 |
PROBLEM TO BE SOLVED: To provide a compound that is useful for improving lithography characteristics, a polymeric compound derived from the compound, a resist composition comprising the polymeric compound, and a method for forming a pattern.SOLUTION: The compound is expressed by general formula (a0-1) below. In the formula, Rrepresents H or an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Yand Yrepresent a single bond or a divalent connecting group; Rand Rrepresent a functional group or a group expressed by formula (1-an1), (1-an2) or (1-an3); n1 represents an integer of 0 to 2; n2 represents 0 or 1; Y1 represents a single bond or -SO-; Rrepresents a cyclic group which may have a substituent, a linear alkyl group which may have a substituent, or a linear alkenyl group which may have a substituent; and Xrepresents an organic cation or a metal cation. |
