| 摘要 |
PROBLEM TO BE SOLVED: To highly accurately measure the position of a wafer stage.SOLUTION: Using a displacement sensor 21 provided at the leading end of a reference arm 20 arranged in a measurement arm 71, the displacement of the trunk part of the measurement arm 71 is measured. Using the result of the measurement, the result of the measurement of a micromotion stage position measurement system (head unit 77) is corrected. Thus, even if the leading end at which the head unit 77 is provided is minutely displaced, resulting from external force or the like acting on the measurement arm 71 in the form of a cantilever beam, the position of a wafer stage (wafer table) is measured highly accurately and can be controlled. |
