The present invention relates to a method of manufacturing an EMI shielding layer. A method of manufacturing an EMI shielding layer according to one embodiment of the present invention includes a step of providing an EMI shielding object; a step of providing roughness on the surface of the EMI shielding object; and a step of forming a conducive layer on the surface having roughness.
申请公布号
KR101431613(B1)
申请公布日期
2014.08.22
申请号
KR20130088311
申请日期
2013.07.25
申请人
SNSCHEM CO., LTD.
发明人
KO, JUNG WOO;YUN, SOUNG YOUNG;OH, JEONG HUN;SON, JIN HO;SEO, KYOUNG WON;YUK, YEONG NAN;LEE, HYEONG KEUN;SONG, KI WAN;KIM, KYONG MIN;PARK, HYUN KOOK;KIM, HONG KI;JUNG, HEE DON;PARK, KYUNG HO;BANG, TAE JO
