| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. |
| 申请公布号 |
US2014233004(A1) |
申请公布日期 |
2014.08.21 |
| 申请号 |
US201414266591 |
申请日期 |
2014.04.30 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
Streefkerk Bob;Baselmans Johannes Jacobus Matheus;Bruls Richard Joseph;Dierichs Marcel Mathijs Theodore Marie;Donders Sjoerd Nicolaas Lambertus;Hoogendam Christiaan Alexander;Jansen Hans;Loopstra Erik Roelof;Mertens Jeroen Johannes Sophia Maria;Mulkens Johannes Catharinus Hubertus;Severijns Ronald Walther Jeanne;Shulepov Sergei;Boom Herman;Sengers Timotheus Franciscus |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithographic apparatus, comprising:
a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; and a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, wherein the liquid has a contact angle of (a) less than 60° with the projection system, or the liquid supply system, or both, or (b) less than 80° with a surface of the substrate, or (c) both (a) and (b). |
| 地址 |
Veldhoven NL |
