发明名称 METHOD FOR PRODUCING STEP-AND-REPEAT VAPOR DEPOSITION MASK, STEP-AND-REPEAT VAPOR DEPOSITION MASK OBTAINED THEREFROM, AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT
摘要 A method for producing a multiple-surface imposition vapor deposition mask enhances definition and reduces weight even when a size is increased. Each of multiple masks in an open space in a frame is configured by a metal mask having a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows. In formation of the plurality of masks, after each of the metal masks and a resin film material for producing the resin mask are attached to the frame, the resin film material is processed, and the openings corresponding to the pattern to be produced by vapor deposition are formed in a plurality of rows lengthwise and crosswise, whereby the multiple-surface imposition vapor deposition mask of the above described configuration is produced.
申请公布号 KR20140102236(A) 申请公布日期 2014.08.21
申请号 KR20147016829 申请日期 2013.01.11
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 HIROBE YOSHINORI;MATSUMOTO YUTAKA;USHIKUSA MASATO;TAKEDA TOSHIHIKO;OBATA KATSUNARI;NISHIMURA HIROYUKI
分类号 H01L51/56;C23C14/24;H01L51/50;H05B33/10 主分类号 H01L51/56
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