SOURCE GAS SUPPLY DEVICE, DEPOSITION APPARATUS, MATERIAL SUPPLY METHOD AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a source gas supply device and the like excellent in responsibility and source gas flow rate stability.SOLUTION: A source gas supply device used for a deposition apparatus for performing deposition on a substrate W comprises: a carrier gas supply part 41 for supplying a carrier gas to a material container 3 which stores a liquid or solid material; a flow rate measurement part measures a flow rate of a vaporized material supplied to the deposition apparatus via a source gas supply route 210; and a control part 5 for comparing a flow rate measured value of the vaporized material with a preset target value to control a pressure control part PC1 so as to increase a pressure inside the material container 3 when the flow rate measured value is higher than the target value, and so as to decrease the pressure inside the material container 3 when the measured value is lower than the target value.