| 摘要 |
<p>Provided are a continuous plating patterning roll, which solves the problem of side etching and has excellent insulating layer adhesiveness, and a manufacturing method therefor. The continuous plating patterning roll is configured so as to be obtained by: coating a photoresist on the surface of a platable cylindrical metal substrate and exposing/developing same to form resist pattern sections and non-resist pattern sections; etching the cylindrical metal substrate of the non-resist pattern sections to form etched depressions; forming a DLC coating film on the etched depressions and the surface of the resist pattern sections; and peeling the DLC coating film formed on the resist pattern section from each resist pattern section and leaving the DLC coating film in the etched depressions.</p> |
