发明名称 CHEMICAL SUPPLIER, PROCESSING APPARATUS INCLUDING THE CHEMICAL SUPPLIER
摘要 A chemical supplier includes a chemical reservoir containing a chemical mixture at a room temperature, an inner space of the chemical reservoir being separated from surroundings, a supply line through which the chemical mixture is supplied to a process chamber from the chemical reservoir, an inline heater positioned on the supply line and heating the chemical mixture in the supply line to a process temperature, and a power source driving the chemical mixture to move the chemical mixture toward the process chamber.
申请公布号 US2014231010(A1) 申请公布日期 2014.08.21
申请号 US201414183994 申请日期 2014.02.19
申请人 PARK Sang-Jine;YOON Bo-Un;HAN Jeong-Nam;KWON Kee-Sang;YUN Doo-Sung;CHOI Won-Sang 发明人 PARK Sang-Jine;YOON Bo-Un;HAN Jeong-Nam;KWON Kee-Sang;YUN Doo-Sung;CHOI Won-Sang
分类号 H01L21/67 主分类号 H01L21/67
代理机构 代理人
主权项 1. A chemical supplier, comprising: a chemical reservoir containing a chemical mixture at a room temperature, an inner space of the chemical reservoir being separated from surroundings; a supply line through which the chemical mixture is supplied to a process chamber from the chemical reservoir; an inline heater positioned on the supply line and heating the chemical mixture in the supply line to a process temperature; and a power source driving the chemical mixture to move the chemical mixture toward the process chamber.
地址 Yongin-si KR