发明名称 |
METHOD AND SYSTEM FOR MEASURING PATTERNED SUBSTRATES |
摘要 |
A system and method of measuring feature depth using a common path auto-correlation low coherence interferometer including a light source having an output directed toward a first beam splitter, the first beam splitter directing at least a portion of a light beam from the light source toward a sample having two reflective interfaces including a top surface reflective interface and a feature bottom reflective interface. The first beam splitter can also pass toward a second beam splitter each of a reference light beam reflected from the top surface interface and a measurement light beam reflected from the feature bottom reflective interface. The second beam splitter directs the reference light beam to a first mirror and the measurement light beam to a second mirror and combines a reflected measurement light beam from the second mirror and a reflected reference light beam from the first mirror to form an interference pattern. |
申请公布号 |
US2014233016(A1) |
申请公布日期 |
2014.08.21 |
申请号 |
US201414260054 |
申请日期 |
2014.04.23 |
申请人 |
APPLEJACK 199 L,P., |
发明人 |
Aiyer Arun Ananth |
分类号 |
G01B11/24;G01B9/02 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
1. A common path auto-correlation low coherence interferometer system comprising:
a light source having an output directed toward a first beam splitter; the first beam splitter configured to direct at least a portion of a light beam output by the light source toward a sample having two reflective interfaces including a top surface reflective interface and a feature bottom reflective interface; the first beam splitter further configured to pass toward a second beam splitter each of a reference light beam reflected from the top surface interface and a measurement light beam reflected from the feature bottom reflective interface; the second beam splitter configured to direct the reference light beam to a first mirror and the measurement light beam to a second mirror, wherein the first mirror is a first distance from the second beam splitter and the second mirror is a second distance from the second beam splitter; the second beam splitter further configured to combine a reflected measurement light beam reflected from the second mirror and a reflected reference light beam reflected from the first mirror and direct a resulting interference pattern toward a detector, wherein the first mirror is a scanning mirror such that a difference distance between the first distance and the second distance is equal to an optical separation between the feature bottom reflective interface and the top surface reflective interface. |
地址 |
San Jose CA US |