发明名称 METHOD AND SYSTEM FOR MEASURING PATTERNED SUBSTRATES
摘要 A system and method of measuring feature depth using a common path auto-correlation low coherence interferometer including a light source having an output directed toward a first beam splitter, the first beam splitter directing at least a portion of a light beam from the light source toward a sample having two reflective interfaces including a top surface reflective interface and a feature bottom reflective interface. The first beam splitter can also pass toward a second beam splitter each of a reference light beam reflected from the top surface interface and a measurement light beam reflected from the feature bottom reflective interface. The second beam splitter directs the reference light beam to a first mirror and the measurement light beam to a second mirror and combines a reflected measurement light beam from the second mirror and a reflected reference light beam from the first mirror to form an interference pattern.
申请公布号 US2014233016(A1) 申请公布日期 2014.08.21
申请号 US201414260054 申请日期 2014.04.23
申请人 APPLEJACK 199 L,P., 发明人 Aiyer Arun Ananth
分类号 G01B11/24;G01B9/02 主分类号 G01B11/24
代理机构 代理人
主权项 1. A common path auto-correlation low coherence interferometer system comprising: a light source having an output directed toward a first beam splitter; the first beam splitter configured to direct at least a portion of a light beam output by the light source toward a sample having two reflective interfaces including a top surface reflective interface and a feature bottom reflective interface; the first beam splitter further configured to pass toward a second beam splitter each of a reference light beam reflected from the top surface interface and a measurement light beam reflected from the feature bottom reflective interface; the second beam splitter configured to direct the reference light beam to a first mirror and the measurement light beam to a second mirror, wherein the first mirror is a first distance from the second beam splitter and the second mirror is a second distance from the second beam splitter; the second beam splitter further configured to combine a reflected measurement light beam reflected from the second mirror and a reflected reference light beam reflected from the first mirror and direct a resulting interference pattern toward a detector, wherein the first mirror is a scanning mirror such that a difference distance between the first distance and the second distance is equal to an optical separation between the feature bottom reflective interface and the top surface reflective interface.
地址 San Jose CA US