发明名称 CAPACITORS HAVING DIELECTRIC LAYERS WITH DIFFERENT BAND GAPS AND SEMICONDUCTOR DEVICES USING THE SAME
摘要 A capacitor of a memory device includes dielectric layers with different energy band gaps. The capacitor may include, for example, a first electrode and a first dielectric layer on the first electrode. The capacitor may further include a second dielectric layer on the first dielectric layer. The first and second dielectric layers may include the same dielectric material with different concentration of an impurity therein. A second electrode is disposed on the second dielectric layer.
申请公布号 US2014231958(A1) 申请公布日期 2014.08.21
申请号 US201314070988 申请日期 2013.11.04
申请人 Samsung Electronics Co., Ltd. 发明人 Lim Han-Jin;Nam Seok-Woo;Oh Jung-Hwan;Im Ki-Vin
分类号 H01L49/02 主分类号 H01L49/02
代理机构 代理人
主权项 1. A capacitor comprising: a first electrode; a first dielectric layer on the first electrode; a second dielectric layer on the first dielectric layer, wherein the first and second dielectric layers comprise the same dielectric material with different concentration of an impurity therein; and a second electrode formed on the second dielectric layer.
地址 Suwon-si KR