发明名称 |
CAPACITORS HAVING DIELECTRIC LAYERS WITH DIFFERENT BAND GAPS AND SEMICONDUCTOR DEVICES USING THE SAME |
摘要 |
A capacitor of a memory device includes dielectric layers with different energy band gaps. The capacitor may include, for example, a first electrode and a first dielectric layer on the first electrode. The capacitor may further include a second dielectric layer on the first dielectric layer. The first and second dielectric layers may include the same dielectric material with different concentration of an impurity therein. A second electrode is disposed on the second dielectric layer. |
申请公布号 |
US2014231958(A1) |
申请公布日期 |
2014.08.21 |
申请号 |
US201314070988 |
申请日期 |
2013.11.04 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Lim Han-Jin;Nam Seok-Woo;Oh Jung-Hwan;Im Ki-Vin |
分类号 |
H01L49/02 |
主分类号 |
H01L49/02 |
代理机构 |
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代理人 |
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主权项 |
1. A capacitor comprising:
a first electrode; a first dielectric layer on the first electrode; a second dielectric layer on the first dielectric layer, wherein the first and second dielectric layers comprise the same dielectric material with different concentration of an impurity therein; and a second electrode formed on the second dielectric layer. |
地址 |
Suwon-si KR |