发明名称 RADIATION SOURCE-COLLECTOR AND METHOD FOR MANUFACTURE
摘要 <p>A method of manufacturing a multi-layer mirror (500) comprising a multi-layer stack of pairs of alternating layers of a first material (510) and silicon (520), the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer (540) of the first material with a dopant material.</p>
申请公布号 WO2014124769(A1) 申请公布日期 2014.08.21
申请号 WO2014EP50552 申请日期 2014.01.14
申请人 ASML NETHERLANDS B.V. 发明人 KUZNETSOV, ALEXEY;BOOGAARD, ARJEN;HUIJBREGTSE, JEROEN;NIKIPELOV, ANDREY;VAN KAMPEN, MAARTEN
分类号 G21K1/06;H05G2/00 主分类号 G21K1/06
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