发明名称 |
RADIATION SOURCE-COLLECTOR AND METHOD FOR MANUFACTURE |
摘要 |
<p>A method of manufacturing a multi-layer mirror (500) comprising a multi-layer stack of pairs of alternating layers of a first material (510) and silicon (520), the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer (540) of the first material with a dopant material.</p> |
申请公布号 |
WO2014124769(A1) |
申请公布日期 |
2014.08.21 |
申请号 |
WO2014EP50552 |
申请日期 |
2014.01.14 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KUZNETSOV, ALEXEY;BOOGAARD, ARJEN;HUIJBREGTSE, JEROEN;NIKIPELOV, ANDREY;VAN KAMPEN, MAARTEN |
分类号 |
G21K1/06;H05G2/00 |
主分类号 |
G21K1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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