发明名称 |
DIAMOND GaN DEVICES AND ASSOCIATED METHODS |
摘要 |
Semiconductor devices and methods of making thereof are provided. In one aspect, for example, a method for making a semiconductor device can include polishing a working surface of a diamond layer to a substantially flat surface, depositing a buffer layer on the working surface of the diamond layer, and depositing a semiconductor layer on the buffer layer. In one specific aspect, the c-axis of the buffer layer is oriented perpendicular to the working surface of the diamond layer. |
申请公布号 |
US2014231825(A1) |
申请公布日期 |
2014.08.21 |
申请号 |
US201314024549 |
申请日期 |
2013.09.11 |
申请人 |
Sung Chien-Min |
发明人 |
Sung Chien-Min |
分类号 |
H01L21/02;H01L29/16;H01L29/20 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
1. A method of making a semiconductor device, comprising:
polishing a working surface of a diamond layer to a substantially flat surface; depositing a buffer layer on the working surface of the diamond layer; and depositing a semiconductor layer on the buffer layer. |
地址 |
Tansui TW |