发明名称 DIAMOND GaN DEVICES AND ASSOCIATED METHODS
摘要 Semiconductor devices and methods of making thereof are provided. In one aspect, for example, a method for making a semiconductor device can include polishing a working surface of a diamond layer to a substantially flat surface, depositing a buffer layer on the working surface of the diamond layer, and depositing a semiconductor layer on the buffer layer. In one specific aspect, the c-axis of the buffer layer is oriented perpendicular to the working surface of the diamond layer.
申请公布号 US2014231825(A1) 申请公布日期 2014.08.21
申请号 US201314024549 申请日期 2013.09.11
申请人 Sung Chien-Min 发明人 Sung Chien-Min
分类号 H01L21/02;H01L29/16;H01L29/20 主分类号 H01L21/02
代理机构 代理人
主权项 1. A method of making a semiconductor device, comprising: polishing a working surface of a diamond layer to a substantially flat surface; depositing a buffer layer on the working surface of the diamond layer; and depositing a semiconductor layer on the buffer layer.
地址 Tansui TW