| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive siloxane composition capable of forming a cured film which allows development with a dilute alkaline developer, exhibits significantly good heat resistance and chemical resistance as well as high transparency after heat curing, and generates little benzene during high temperature treatment.SOLUTION: The photosensitive siloxane composition comprises (a) a polysiloxane obtained by hydrolysis and condensation of a compound represented by the specified general formula (1), (b) a quinonediazide compound, and (c) a solvent. |
