| 摘要 |
In the context of the production of silicon ingots for solar cell, the present invention relates to technology for removing and reusing impurities from a silicon dissolution process by using a water jet in a site comprising the impurities. To this end, the silicon plate impurity removing method of the present invention entails immersion in water up to the upper surface of a silicon plate comprising impurities constituted by portions cut from a polycrystalline silicon block, and, in this state, removing the impurities by using a water jet; the water sprayed from the water jet comprising an abrasive. |
